Work with academic experts in process chemistry and technology

A scholar or researcher with expertise in process chemistry and technology can help business and industrial clients solve their process chemistry and technology problems and conduct process chemistry and technology research to get ahead on R&D. Experts on NotedSource with backgrounds in process chemistry and technology include Tim Osswald, Keisha Walters, Deep Jariwala, Osaye Fadekemi, PhD, and Nima Ziraknejad.

Osaye Fadekemi, PhD

Assistant Professor of Mathematics at Alabama State University with expertise in Graph Theory and Network Modeling
Most Relevant Research Interests
Process Chemistry and Technology
Other Research Interests (21)
Graph Theory
Discrete Mathematics
Network Modeling
Disease Modeling
Discrete Mathematics and Combinatorics
And 16 more
About
Most Relevant Publications (1+)

7 total publications

An Interpretable Machine Learning Approach for Hepatitis B Diagnosis

Applied Sciences / Nov 02, 2022

Obaido, G., Ogbuokiri, B., Swart, T. G., Ayawei, N., Kasongo, S. M., Aruleba, K., Mienye, I. D., Aruleba, I., Chukwu, W., Osaye, F., Egbelowo, O. F., Simphiwe, S., & Esenogho, E. (2022). An Interpretable Machine Learning Approach for Hepatitis B Diagnosis. Applied Sciences, 12(21), 11127. https://doi.org/10.3390/app122111127

Nima Ziraknejad

PhD and Co-Founder of Health and Safety Startup
British Columbia
Most Relevant Research Interests
Process Chemistry and Technology
Process Chemistry and Technology
Other Research Interests (30)
Engineering
Robotics
Control
Machine vision
Electric field imaging
And 25 more
About
Most Relevant Publications (2+)

15 total publications

Measuring generative appropriability: Experiments with US semiconductor patents

World Patent Information / Sep 01, 2022

Denter, N. M., & Lai, M. Y. (2022). Measuring generative appropriability: Experiments with US semiconductor patents. World Patent Information, 70, 102130. https://doi.org/10.1016/j.wpi.2022.102130

Measuring generative appropriability: Experiments with US semiconductor patents

World Patent Information / Sep 01, 2022

Denter, N. M., & Lai, M. Y. (2022). Measuring generative appropriability: Experiments with US semiconductor patents. World Patent Information, 70, 102130. https://doi.org/10.1016/j.wpi.2022.102130