Optical Microlithography XVIII / May 12, 2005

Gallatin, G. M. (2005, May 12). Resist blur and line edge roughness. Optical Microlithography XVIII. https://doi.org/10.1117/12.607233

Applied Optics / Nov 01, 1988

de Groot, P. J., Gallatin, G. M., & Macomber, S. H. (1988). Ranging and velocimetry signal generation in a backscatter-modulated laser diode. Applied Optics, 27(21), 4475. https://doi.org/10.1364/ao.27.004475

ACS Nano / Feb 22, 2016

Liddle, J. A., & Gallatin, G. M. (2016). Nanomanufacturing: A Perspective. ACS Nano, 10(3), 2995–3014. https://doi.org/10.1021/acsnano.5b03299

World Patent Information / Sep 01, 1997

How a US Patent Protects You, and Does Your Project Qualify for a US Patent? (1997). World Patent Information, 19(3), 239. https://doi.org/10.1016/s0172-2190(97)90099-5

Journal of the Optical Society of America B / Mar 01, 1991

Gallatin, G. M., & Gould, P. L. (1991). Laser focusing of atomic beams. Journal of the Optical Society of America B, 8(3), 502. https://doi.org/10.1364/josab.8.000502

Nanoscale / Jan 01, 2011

Liddle, J. A., & Gallatin, G. M. (2011). Lithography, metrology and nanomanufacturing. Nanoscale, 3(7), 2679. https://doi.org/10.1039/c1nr10046g

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Mar 01, 2004

Goldfarb, D. L., Mahorowala, A. P., Gallatin, G. M., Petrillo, K. E., Temple, K., Angelopoulos, M., Rasgon, S., Sawin, H. H., Allen, S. D., Lawson, M. C., & Kwong, R. W. (2004). Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 22(2), 647–653. https://doi.org/10.1116/1.1667513

Optics Express / Mar 10, 2008

De Groot, P., Colonna de Lega, X., Liesener, J., & Darwin, M. (2008). Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling. Optics Express, 16(6), 3970. https://doi.org/10.1364/oe.16.003970

Applied Physics Letters / Aug 17, 1987

Macomber, S. H., Mott, J. S., Noll, R. J., Gallatin, G. M., Gratrix, E. J., O’Dwyer, S. L., & Lambert, S. A. (1987). Surface-emitting distributed feedback semiconductor laser. Applied Physics Letters, 51(7), 472–474. https://doi.org/10.1063/1.98397

Advances in Resist Technology and Processing XX / Jun 11, 2003

Hinsberg, W. D., Houle, F. A., Sanchez, M. I., Hoffnagle, J. A., Wallraff, G. M., Medeiros, D. R., Gallatin, G. M., & Cobb, J. L. (2003). Extendibility of chemically amplified resists: another brick wall? In T. H. Fedynyshyn (Ed.), SPIE Proceedings. SPIE. https://doi.org/10.1117/12.487739

SPIE Proceedings / May 28, 2004

Rosenbluth, A. E., Gallatin, G. M., Gordon, R. L., Hinsberg, W., Hoffnagle, J., Houle, F., Lai, K., Lvov, A., Sanchez, M., & Seong, N. (2004). Fast calculation of images for high numerical aperture lithography. In B. W. Smith (Ed.), Optical Microlithography XVII. SPIE. https://doi.org/10.1117/12.537716

SPIE Proceedings / Jun 07, 1996

Drazkiewicz, S., Gallatin, G. M., & Lyons, J. (1996). <title>Micrascan adaptive x-cross correlative independent off-axis modular (AXIOM) alignment system</title> In G. E. Fuller (Ed.), Optical Microlithography IX. SPIE. https://doi.org/10.1117/12.240980

Aug 10, 2009

(2009). US Patent Office: Telecom patents aquired by selected equipment manufacturers. Organisation for Economic Co-Operation and Development (OECD). https://doi.org/10.1787/comms_outlook-2009-table3_11-en

SPIE Proceedings / Mar 14, 2008

Gallatin, G. M., Naulleau, P., Niakoula, D., Brainard, R., Hassanein, E., Matyi, R., Thackeray, J., Spear, K., & Dean, K. (2008). Resolution, LER, and sensitivity limitations of photoresists. In F. M. Schellenberg (Ed.), Emerging Lithographic Technologies XII. SPIE. https://doi.org/10.1117/12.772763

SPIE Proceedings / Mar 16, 2007

Gallatin, G. M., Naulleau, P., & Brainard, R. (2007). Fundamental limits to EUV photoresist. In Q. Lin (Ed.), Advances in Resist Materials and Processing Technology XXIV. SPIE. https://doi.org/10.1117/12.712346

Applied Optics / Jun 10, 2003

Naulleau, P. P., & Gallatin, G. M. (2003). Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization. Applied Optics, 42(17), 3390. https://doi.org/10.1364/ao.42.003390

Optics Letters / Jan 15, 1989

de Groot, P. J., & Gallatin, G. M. (1989). Backscatter-modulation velocimetry with an external-cavity laser diode. Optics Letters, 14(3), 165. https://doi.org/10.1364/ol.14.000165

Advanced Functional Materials / Jan 17, 2012

Ko, S. H., Gallatin, G. M., & Liddle, J. A. (2012). Nanomanufacturing with DNA Origami: Factors Affecting the Kinetics and Yield of Quantum Dot Binding. Advanced Functional Materials, 22(5), 1015–1023. Portico. https://doi.org/10.1002/adfm.201102077

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Nov 01, 1994

Nelson, M., Kreuzer, J. L., & Gallatin, G. (1994). Design and test of a through-the-mask alignment sensor for a vertical stage x-ray aligner. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 12(6), 3251–3255. https://doi.org/10.1116/1.587508

Physical Review A / Jul 05, 2012

Gallatin, G. M., & McMorran, B. (2012). Propagation of vortex electron wave functions in a magnetic field. Physical Review A, 86(1). https://doi.org/10.1103/physreva.86.012701

25th AIAA Aerodynamic Measurement Technology and Ground Testing Conference / Jun 05, 2006

Sheeley, J., Whittingham, K., Montgomery, P., & Russell, G. (2006, June 5). Extending Arc Heater Operating Pressure Range for Improved Reentry Simulation. 25th AIAA Aerodynamic Measurement Technology and Ground Testing Conference. https://doi.org/10.2514/6.2006-3295

Macromolecules / Nov 19, 2012

Patrone, P. N., & Gallatin, G. M. (2012). Modeling Line Edge Roughness in Templated, Lamellar Block Copolymer Systems. Macromolecules, 45(23), 9507–9516. https://doi.org/10.1021/ma301421j

MRS Proceedings / Jan 01, 2002

Alexander Liddle, J., Gallatin, G. M., & Ocola, L. E. (2002). Resist Requirements and Limitations for Nanoscale Electron-Beam Patterning. MRS Proceedings, 739. https://doi.org/10.1557/proc-739-h1.5

SPIE Proceedings / Apr 25, 1990

de Groot, P., Gallatin, G., & Gardopee, G. (1990). Optical Testing Using Laser Feedback Metrology. In R. J. Pryputniewicz (Ed.), Laser Interferometry: Quantitative Analysis of Interferograms: Third in a Series. SPIE. https://doi.org/10.1117/12.962738

Chem. Commun. / Jan 01, 2013

Du, K., Ko, S. H., Gallatin, G. M., Yoon, H. P., Alexander Liddle, J., & Berglund, A. J. (2013). Quantum dot-DNA origami binding: a single particle, 3D, real-time tracking study. Chem. Commun., 49(9), 907–909. https://doi.org/10.1039/c2cc37517f

SPIE Proceedings / May 28, 2004

Lai, K., Gallatin, G. M., van de Kerkhof, M. A., de Boeij, W., Kok, H., Schriever, M., Morillo, J. D., Fair, R. H., Bennett, S., & Corliss, D. A. (2004). New paradigm in lens metrology for lithographic scanner: evaluation and exploration. In B. W. Smith (Ed.), Optical Microlithography XVII. SPIE. https://doi.org/10.1117/12.536550

World Patent Information / Mar 01, 2001

Crawford, J. (2001). Web sites for patent information centers: the US experience. World Patent Information, 23(1), 75–77. https://doi.org/10.1016/s0172-2190(00)00092-2

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Nov 01, 2008

Naulleau, P. P., & Gallatin, G. (2008). Spatial scaling metrics of mask-induced line-edge roughness. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 26(6), 1903–1910. https://doi.org/10.1116/1.3010712

SPIE Proceedings / Sep 13, 1989

de Groot, P. J., D’Amato, F. X., Gallatin, G. M., Dixon, R., & Roychoudhuri, C. (1989). Backscatter-Modulation Semiconductor Laser Radar. In R. J. Becherer (Ed.), Laser Radar IV. SPIE. https://doi.org/10.1117/12.960569

SPIE Proceedings / Nov 01, 1990

Bollinger, L. D., Gallatin, G. M., Samuels, J., Steinberg, G., & Zarowin, C. B. (1990). Rapid, noncontact optical figuring of aspheric surfaces with plasma-assisted chemical etching. In G. M. Sanger, P. B. Reid, & L. R. Baker (Eds.), Advanced Optical Manufacturing and Testing. SPIE. https://doi.org/10.1117/12.22788

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Nov 01, 2003

Gallatin, G. M., Houle, F. A., & Cobb, J. L. (2003). Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 21(6), 3172–3176. https://doi.org/10.1116/1.1629294

Chemical Physics Letters / Jan 01, 2011

Boukai, A., Haney, P., Katzenmeyer, A., Gallatin, G. M., Talin, A. A., & Yang, P. (2011). Efficiency enhancement of copper contaminated radial p–n junction solar cells. Chemical Physics Letters, 501(4–6), 153–158. https://doi.org/10.1016/j.cplett.2010.11.069

SPIE Proceedings / Mar 14, 2008

Hassanein, E., Higgins, C., Naulleau, P., Matyi, R., Gallatin, G., Denbeaux, G., Antohe, A., Thackeray, J., Spear, K., Szmanda, C., Anderson, C. N., Niakoula, D., Malloy, M., Khurshid, A., Montgomery, C., Piscani, E. C., Rudack, A., Byers, J., Ma, A., … Brainard, R. (2008). Film quantum yields of EUV and ultra-high PAG photoresists. In F. M. Schellenberg (Ed.), Emerging Lithographic Technologies XII. SPIE. https://doi.org/10.1117/12.774099

SPIE Proceedings / Apr 26, 2001

Gallatin, G. M. (2001). Continuum model of shot noise and line edge roughness. In C. A. Mack & T. Stevenson (Eds.), Lithography for Semiconductor Manufacturing II. SPIE. https://doi.org/10.1117/12.425198

Journal of Applied Physics / Jun 15, 1989

Gallatin, G. M., & Zarowin, C. B. (1989). Unified approach to the temporal evolution of surface profiles in solid etch and deposition processes. Journal of Applied Physics, 65(12), 5078–5088. https://doi.org/10.1063/1.343184

Optical Engineering / Apr 01, 1989

de Groot, P. J., & Gallatin, G. M. (1989). Three-Dimensional Imaging Coherent Laser Radar Array. Optical Engineering, 28(4). https://doi.org/10.1117/12.7976973

SPIE Proceedings / Oct 06, 2006

Sullivan, D., Okawa, Y., Sugawara, K., Benes, Z., & Kotani, J. (2006). Chemical flare long-range proximity effects in photomask manufacturing with chemically amplified resists. In P. M. Martin & R. J. Naber (Eds.), Photomask Technology 2006. SPIE. https://doi.org/10.1117/12.686732

Journal of Micro/Nanolithography, MEMS, and MOEMS / Oct 04, 2018

Naulleau, P., & Gallatin, G. (2018). Relative importance of various stochastic terms and EUV patterning. Journal of Micro/Nanolithography, MEMS, and MOEMS, 17(04), 1. https://doi.org/10.1117/1.jmm.17.4.041015

SPIE Proceedings / Jun 13, 2003

Cobb, J. L., Houle, F. A., & Gallatin, G. M. (2003). Estimated impact of shot noise in extreme-ultraviolet lithography. In R. L. Engelstad (Ed.), Emerging Lithographic Technologies VII. SPIE. https://doi.org/10.1117/12.484730

Applied Optics / Jul 01, 1989

de Groot, P., Gallatin, G., Gardopee, G., & Dixon, R. (1989). Laser feedback metrology of optical systems. Applied Optics, 28(13), 2462. https://doi.org/10.1364/ao.28.002462

Advances in Resist Technology and Processing XX / Jun 11, 2003

Mahorowala, A. P., Goldfarb, D. L., Temple, K., Petrillo, K. E., Pfeiffer, D., Babich, K., Angelopoulos, M., Gallatin, G. M., Rasgon, S., Sawin, H. H., Allen, S. D., Lang, R. N., Lawson, M. C., Kwong, R. W., Chen, K.-J., Li, W., Varanasi, P. R., Sanchez, M. I., Ito, H., … Allen, R. D. (2003). Impact of thin resist processes on post-etch LER. In T. H. Fedynyshyn (Ed.), SPIE Proceedings. SPIE. https://doi.org/10.1117/12.485168

Applied Optics / Oct 01, 2001

Gallatin, G. M. (2001). High-numerical-aperture scalar imaging. Applied Optics, 40(28), 4958. https://doi.org/10.1364/ao.40.004958

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena / Nov 01, 2010

Naulleau, P. P., & Gallatin, G. M. (2010). Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 28(6), 1259–1266. https://doi.org/10.1116/1.3509437

Microlithography / May 11, 2007

Gallatin, G. (2007). Alignment and Overlay. In Microlithography (pp. 287–328). CRC Press. https://doi.org/10.1201/9781420051537.ch5

Filling the Ranks / Jan 01, 2004

Restructuring Reserve Compensation. (2004). In Filling the Ranks. The MIT Press. https://doi.org/10.7551/mitpress/2990.003.0009

SPIE Proceedings / Jun 07, 1996

Williamson, D. M., McClay, J. A., Andresen, K. W., Gallatin, G. M., Himel, M. D., Ivaldi, J., Mason, C. J., McCullough, A. W., Otis, C., Shamaly, J. J., & Tomczyk, C. (1996). <title>Micrascan III: 0.25-um resolution step-and-scan system</title> In G. E. Fuller (Ed.), Optical Microlithography IX. SPIE. https://doi.org/10.1117/12.240939

Annual Meeting Optical Society of America / Jan 01, 1988

De Groot, P. J., Gallatin, G. M., & Macomber, S. H. (1988). Ranging and velocimetry signal generation in a backscatter-modulated laser diode. Annual Meeting Optical Society of America. https://doi.org/10.1364/oam.1988.mo3

Emerging Lithographic Technologies VI / Jul 05, 2002

Cobb, J. L., Dentinger, P. M., Hunter, L. L., O’Connell, D. J., Gallatin, G. M., Hinsberg, W. D., Houle, F. A., Sanchez, M. I., Domke, W.-D., Wurm, S., Okoroanyanwu, U., & Lee, S. H. (2002). EUV photoresist performance results from the VNL and the EUV LLC. In R. L. Engelstad (Ed.), SPIE Proceedings. SPIE. https://doi.org/10.1117/12.472316

SPIE Proceedings / Mar 17, 2011

Gallatin, G. M., & Naulleau, P. P. (2011). Modeling the transfer of line edge roughness from an EUV mask to the wafer. In B. M. La Fontaine & P. P. Naulleau (Eds.), Extreme Ultraviolet (EUV) Lithography II. SPIE. https://doi.org/10.1117/12.881641

IET International Conference on Wireless Mobile and Multimedia Networks Proceedings (ICWMMN 2006) / Jan 01, 2006

Hailong Zhu, & Shengli Lai. (2006). Antenna design for long range 13.56 MHz RFID reader. IET International Conference on Wireless Mobile and Multimedia Networks Proceedings (ICWMMN 2006). https://doi.org/10.1049/cp:20061234

SPIE Proceedings / Mar 29, 2012

Gallatin, G. M., Naulleau, P. P., & Brainard, R. L. (2012). Modeling the effects of acid amplifiers on photoresist stochastics. In P. P. Naulleau & O. R. Wood II (Eds.), Extreme Ultraviolet (EUV) Lithography III. SPIE. https://doi.org/10.1117/12.917006

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Mar 01, 2001

Liddle, J. A., Blakey, M. I., Bolan, K., Farrow, R. C., Gallatin, G. M., Kasica, R., Katsap, V., Knurek, C. S., Li, J., Mkrtchyan, M., Novembre, A. E., Ocola, L., Orphanos, P. A., Peabody, M. L., Stanton, S. T., Teffeau, K., Waskiewicz, W. K., & Munro, E. (2001). Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 19(2), 476–481. https://doi.org/10.1116/1.1359174

Microelectronic Engineering / May 01, 1999

Gallatin, G. M., & Alexander Liddle, J. (1999). Analytical model of the “Shot Noise” effect in photoresist. Microelectronic Engineering, 46(1–4), 365–368. https://doi.org/10.1016/s0167-9317(99)00105-7

SPIE Proceedings / Mar 10, 2006

Chou, D., & McAllister, K. (2006). Line end optimization through optical proximity correction (OPC): a case study. In D. G. Flagello (Ed.), Optical Microlithography XIX. SPIE. https://doi.org/10.1117/12.651455

SPIE Proceedings / Jan 01, 1987

Gallatin, G. M., Webster, J. C., Kintner, E. C., & Wu, F. (1987). Modeling The Images Of Alignment Marks Under Photoresist. In H. L. Stover (Ed.), Optical Microlithography VI. SPIE. https://doi.org/10.1117/12.967050

Journal of Micro/Nanolithography, MEMS, and MOEMS / Oct 01, 2009

Kita, N. (2009). Residual speckle in a lithographic illumination system. Journal of Micro/Nanolithography, MEMS, and MOEMS, 8(4), 043003. https://doi.org/10.1117/1.3256007

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Nov 01, 2008

Anderson, C. N., Naulleau, P. P., Niakoula, D., Hassanein, E., Brainard, R., Gallatin, G., & Dean, K. (2008). Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 26(6), 2295–2299. https://doi.org/10.1116/1.2968615

SPIE Proceedings / Jul 15, 2002

Lai, K., Gallatin, G. M., Rosenbluth, A. E., Fonseca, C. A., Liebmann, L. W., & Progler, C. J. (2002). Methodology for generating exposure tool specifications for alternating phase-shift mask application for 70-nm node. In A. Yen (Ed.), Optical Microlithography XV. SPIE. https://doi.org/10.1117/12.474583

Journal of the Optical Society of America A / Feb 01, 1988

Gallatin, G., Webster, J. C., Kintner, E. C., & Morgant, C. J. (1988). Scattering matrices for imaging layered media. Journal of the Optical Society of America A, 5(2), 220. https://doi.org/10.1364/josaa.5.000220

Optics Express / Jul 03, 2012

Gallatin, G. M., & Berglund, A. J. (2012). Optimal laser scan path for localizing a fluorescent particle in two or three dimensions. Optics Express, 20(15), 16381. https://doi.org/10.1364/oe.20.016381

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Nov 01, 1999

Kim, B., Engelstad, R. L., Lovell, E. G., Stanton, S. T., Liddle, J. A., & Gallatin, G. M. (1999). Finite element analysis of SCALPEL wafer heating. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 17(6), 2883–2887. https://doi.org/10.1116/1.591089

GeoFlorida 2010 / Feb 15, 2010

Lai, P., McVay, M., Bloomquist, D., & Forbes, H. (2010, February 15). An Innovative Prefabricated Pile Installation Method Utilizing Jetting and Pressure Grouting. GeoFlorida 2010. https://doi.org/10.1061/41095(365)161

Photomask Technology 2008 / Oct 24, 2008

Zhang, Q., Song, H., & Lucas, K. (2008). Focus blur model to enhance lithography model for optical proximity correction. In H. Kawahira & L. S. Zurbrick (Eds.), SPIE Proceedings. SPIE. https://doi.org/10.1117/12.802509

SPIE Proceedings / Jun 25, 1999

Liddle, J. A., Blakey, M. I., Gallatin, G. M., Knurek, C. S., Mkrtchyan, M. M., Novembre, A. E., & Waskiewicz, W. K. (1999). Space-charge results from the SCALPEL proof-of-concept system. In Y. Vladimirsky (Ed.), Emerging Lithographic Technologies III. SPIE. https://doi.org/10.1117/12.351090

Microelectronic Engineering / May 01, 1999

Farrow, R. C., Waskiewicz, W. K., Kizilyalli, I., Ocola, L., Felker, J., Biddick, C., Gallatin, G., Mkrtchyan, M., Blakey, M., Kraus, J., Novembre, A., Orphanos, P., Peabody, M., Kasica, R., Kornblit, A., & Klemens, F. (1999). CMOS compatible alignment marks for the SCALPEL proof of lithography tool. Microelectronic Engineering, 46(1–4), 263–266. https://doi.org/10.1016/s0167-9317(99)00077-5

SPIE Proceedings / Aug 18, 2005

Rosenbluth, A. E., Gallatin, G., Lai, K., Seong, N., & Singh, R. N. (2005). Topics in polarization ray tracing for image projectors. In J. M. Sasian, R. J. Koshel, & R. C. Juergens (Eds.), Novel Optical Systems Design and Optimization VIII. SPIE. https://doi.org/10.1117/12.618128

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Nov 01, 2000

Gallatin, G. M. (2000). Analytic evaluation of the intensity point spread function. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 18(6), 3023–3028. https://doi.org/10.1116/1.1324617

SPIE Proceedings / Jun 25, 1999

Farrow, R. C., Waskiewicz, W. K., Kizilyalli, I. C., Gallatin, G. M., Liddle, J. A., Mkrtchyan, M. M., Kornblit, A., Ocola, L. E., Klemens, F. P., Felker, J. A., Biddick, C. J., Kraus, J. S., Blakey, M. I., Orphanos, P. A., Layadi, N., & Merchant, S. M. (1999). Alignment mark detection in CMOS materials with SCALPEL e-beam lithography. In Y. Vladimirsky (Ed.), Emerging Lithographic Technologies III. SPIE. https://doi.org/10.1117/12.351093

SPIE Proceedings / Mar 07, 1989

de Groot, P. J., Gallatin, G. M., & Cullen, M. F. (1989). Compact Imaging System With Ranging And Velocimetry. In D. J. Svetkoff (Ed.), Optics, Illumination, and Image Sensing for Machine Vision III. SPIE. https://doi.org/10.1117/12.949040

Journal of Mathematical Physics / Mar 01, 1984

Gallatin, G. M. (1984). On zeta function regularization for operators with continuous spectra. Journal of Mathematical Physics, 25(3), 629–632. https://doi.org/10.1063/1.526167

Macromolecules / Jul 03, 2014

Patrone, P. N., & Gallatin, G. M. (2014). Response of Block Copolymer Thin-Film Morphology to Line-Width Roughness on a Chemoepitaxial Template. Macromolecules, 47(14), 4824–4829. https://doi.org/10.1021/ma500429x

Physica Scripta / Jun 28, 2006

Yamagami, M. (2006). Pairing-induced spatially extended coherence of low-lying vibrational excitations unique in neutron drip line nuclei. Physica Scripta, T125, 228–229. https://doi.org/10.1088/0031-8949/2006/t125/064

SPIE Proceedings / Jun 25, 1999

Stanton, S. T., Farrow, R. C., Gallatin, G. M., Liddle, J. A., & Waskiewicz, W. K. (1999). Overlay error budgets for a high-throughput SCALPEL system. In Y. Vladimirsky (Ed.), Emerging Lithographic Technologies III. SPIE. https://doi.org/10.1117/12.351127

SPIE Proceedings / May 17, 1994

Cronin, D. J., & Gallatin, G. M. (1994). <title>Micrascan II overlay error analysis</title> In T. A. Brunner (Ed.), Optical/Laser Microlithography VII. SPIE. https://doi.org/10.1117/12.175485

Alternative Lithographic Technologies IV / Mar 01, 2012

Patrone, P. N., & Gallatin, G. M. (2012). Modeling line-edge roughness in lamellar block copolymer systems. In W. M. Tong (Ed.), SPIE Proceedings. SPIE. https://doi.org/10.1117/12.918038

Journal of Photopolymer Science and Technology / Jan 01, 2011

Kruger, S., Higgins, C., Gallatin, C., & Brainard, R. (2011). Lithography and Chemical Modeling of Acid Amplifiers for Use in EUV Photoresists. Journal of Photopolymer Science and Technology, 24(2), 143–152. https://doi.org/10.2494/photopolymer.24.143

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Nov 01, 2000

Fares, N., Stanton, S., Liddle, J., & Gallatin, G. (2000). Analytical-based solutions for SCALPEL wafer heating. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 18(6), 3115–3121. https://doi.org/10.1116/1.1319839

Microelectronic Engineering / May 01, 1999

Stanton, S. T., Alexander Liddle, J., Gallatin, G. M., Kim, B., & Engelstad, R. L. (1999). Initial wafer heating analysis for a SCALPEL lithography system. Microelectronic Engineering, 46(1–4), 235–238. https://doi.org/10.1016/s0167-9317(99)00070-2

SPIE Proceedings / Aug 09, 1988

Macomber, S. H., Mott, J. S., Noll, R. J., Gallatin, G. M., Gratrix, E. J., O’Dwyer-Killeen, S. L., & Lambert, S. A. (1988). AlGaAs Surface Emitting Distributed Feedback Laser. In L. Figueroa (Ed.), High Power Laser Diodes and Applications. SPIE. https://doi.org/10.1117/12.944360

SPIE Proceedings / Feb 09, 1987

Gallatin, G. M. (1987). Properties And Applications Of Layered Grating Resonances. In J. M. Lerner (Ed.), Application and Theory of Periodic Structures, Diffraction Gratings, and Moire Phenomena III. SPIE. https://doi.org/10.1117/12.941748

Microelectronic Engineering / Sep 01, 2001

Mkrtchyan, M., Gallatin, G., Liddle, A., Zhu, X., Munro, E., Waskiewicz, W., & Muller, D. (2001). Mask-membrane impact on image blur in SCALPEL. Microelectronic Engineering, 57–58, 277–284. https://doi.org/10.1016/s0167-9317(01)00524-x

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena / Sep 01, 2000

Gallatin, G. M., Farrow, R. C., Liddle, J. A., Waskiewicz, W. K., Mkrtchyan, M. M., Orphanos, P., Felker, J., Kraus, J., Biddick, C. J., Stanton, S., Novembre, A. E., & Blakey, M. (2000). SCALPEL aerial image monitoring: Principles and application to space charge. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 18(5), 2560–2564. https://doi.org/10.1116/1.1289544

Microlithography / May 01, 2020

Laidler, D., & Gallatin, G. M. (2020). Alignment and Overlay. In Microlithography (pp. 247–292). CRC Press. https://doi.org/10.1201/9781315117171-5

Journal of the Optical Society of America A / Jan 01, 1991

Gallatin, G. M. (1991). Functional-integral representation of rough surfaces. Journal of the Optical Society of America A, 8(1), 97. https://doi.org/10.1364/josaa.8.000097

PsycEXTRA Dataset / Jan 01, 2008

Koop, G. J., & Johnson, J. G. (2008). The Simultaneous Use of Multiple Reference Points in Risky Decision Making [dataset]. In PsycEXTRA Dataset. American Psychological Association (APA). https://doi.org/10.1037/e722352011-126

SPIE Proceedings / Mar 27, 1989

Cullen, M. F., de Groot, P. J., & Gallatin, G. M. (1989). Laser Radar Array Used For Improving Image Analysis Algorithms. In D. P. Casasent (Ed.), Intelligent Robots and Computer Vision VII. SPIE. https://doi.org/10.1117/12.960292

SPIE Proceedings / Jan 29, 1989

Gallatin, G. M., & Zarowin, C. B. (1989). Predicted Polishing Behavior Of Plasma Assisted Chemical Etching (PACE) From A Unified Model Of The Temporal Evolution Of Etched Surfaces. In J. B. Arnold & R. E. Parks (Eds.), Advances in Fabrication and Metrology for Optics and Large Optics. SPIE. https://doi.org/10.1117/12.948054

Journal of Mathematical Physics / Nov 01, 1983

Gallatin, G. M. (1983). A useful formula for evaluating commutators. Journal of Mathematical Physics, 24(11), 2564–2565. https://doi.org/10.1063/1.525650

Simultaneous Inference in Regression / Oct 19, 2010

Confidence Bands for One Multiple Regression Model. (2010). In Simultaneous Inference in Regression (pp. 87–122). CRC Press. https://doi.org/10.1201/b10289-8

SPIE Proceedings / May 28, 2004

Seong, N., Lai, K., Rosenbluth, A. E., & Gallatin, G. M. (2004). Assessing the impact of intrinsic birefringence on 157-nm lithography. In B. W. Smith (Ed.), Optical Microlithography XVII. SPIE. https://doi.org/10.1117/12.544242

Microelectronic Engineering / Jun 01, 2000

Gianoulakis, S., Liddle, J., Stanton, S., & Gallatin, G. (2000). Thermal distortion predictions of a silicon wafer during exposure in a SCALPEL tool. Microelectronic Engineering, 53(1–4), 357–360. https://doi.org/10.1016/s0167-9317(00)00333-6

Microelectronic Engineering / Jun 01, 2000

Farrow, R. C., Gallatin, G. M., Waskiewicz, W. K., Liddle, J. A., Kizilyalli, I., Kornblit, A., Biddick, C., Blakey, M., Klemens, F., Felker, J., Kraus, J., Mkrtchyan, M., Orphanos, P. A., Layadi, N., & Merchant, S. (2000). Marks for SCALPEL® tool optics optimization. Microelectronic Engineering, 53(1–4), 309–312. https://doi.org/10.1016/s0167-9317(00)00321-x